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@article{Bucher2020GeneralizedCC, title={Generalized Constant Current Method for Determining MOSFET Threshold Voltage}, author={Matthias Bucher and Nikolaos Makris and Loukas Chevas}, journal={IEEE Transactions on Electron Devices}, year={2020}, volume={67}, pages={4559-4562}, url={https://api.semanticscholar.org/CorpusID:220935558}}
  • M. Bucher, N. Makris, Loukas Chevas
  • Published in IEEE Transactions on Electron… 2 August 2020
  • Engineering, Physics

A novel method for extracting threshold voltage and substrate effect parameters of MOSFETs with constant current bias at all levels of inversion is presented. This generalized constant-current (GCC) method exploits the charge-based model of MOSFETs to extract threshold voltage and other substrate-effect-related parameters. The method is applicable over a wide range of current throughout weak and moderate inversion, and to some extent in strong inversion. This method is particularly useful when…

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16 References

An Adjusted Constant-Current Method to Determine Saturated and Linear Mode Threshold Voltage of MOSFETs
    A. BazigosM. BucherJ. AssenmacherS. DeckerW. GrabinskiY. Papananos

    Engineering, Physics

    IEEE Transactions on Electron Devices

  • 2011

The constant-current (CC) method uses a current criterion to determine the threshold voltage (VTH) of metal-oxide-semiconductor (MOS) field-effect transistors. We show that using the same current

  • 57
  • Highly Influential
Charge-Based MOS Transistor Modeling
    C. EnzE. Vittoz

    Engineering, Physics

  • 2006
  • 289
  • Highly Influential
An efficient parameter extraction methodology for the EKV MOST model
    Matthias BucherChristophe LallementChristian Enz

    Engineering, Physics

    Proceedings of International Conference on…

  • 1996

This paper presents a new parameter extraction methodology, based on an accurate and continuous MOS model dedicated to low-voltage and low-current analog circuit design and simulation (EKV MOST

  • 116
  • Highly Influential
  • PDF
On the MOSFET Threshold Voltage Extraction by Transconductance and Transconductance-to-Current Ratio Change Methods: Part II—Effect of Drain Voltage
    T. RudenkoV. KilchytskaM. ArshadJ. RaskinA. NazarovD. Flandre

    Engineering, Physics

    IEEE Transactions on Electron Devices

  • 2011

In this paper, we study the effect of the drain voltage on the threshold voltage extraction in long-channel MOSFETs by the transconductance change and transconductance-to-current ratio change

  • 46
  • Highly Influential
  • PDF
Modeling STI Edge Parasitic Current for Accurate Circuit Simulations
    S. KhandelwalH. Agarwal C. Hu

    Engineering, Physics

    IEEE Transactions on Computer-Aided Design of…

  • 2015

It is found that Iedge has a different sub-threshold slope, body-bias coefficient, and short-channel behavior as compared to Imain, so an accurate, efficient, and scalable model for Iedge is developed.

  • 8
Impact of subthreshold hump on bulk-bias dependence of offset voltage variability in weak and moderate inversion regions
    K. SakakibaraT. KumamotoK. Arimoto

    Engineering, Physics

    Proceedings of the IEEE 2012 Custom Integrated…

  • 2012

By using ring gate structure, it is found that bulk-bias dependence of σ(ΔVg) becomes predictable even at operation current level of sub nA.

  • 6
Impact of hump effect on MOSFET mismatch in the sub-threshold area for low power analog applications
    Y. JolyL. Lopez P. Fornara

    Engineering, Physics

    2010 10th IEEE International Conference on Solid…

  • 2010

Analog circuit designs are often biased to work in sub-threshold mode with good gate-source voltage matching performances. Depending on the process, hump effect may change the MOS characteristics for

  • 21
Inversion charge linearization in MOSFET modeling and rigorous derivation of the EKV compact model
    J. SalleseM. BucherF. KrummenacherP. Fazan

    Engineering, Physics

  • 2003
  • 119
  • PDF
Modelling and Characterization of Non-Uniform Substrate Doping
    C. LallementM. BucherC. Enz

    Engineering, Physics

  • 1997
  • 29
Analysis of width edge effects in advanced isolation schemes for deep submicron CMOS technologies
    P. SallagoityM. Ada‐HanifiM. PaoliM. Haond

    Engineering, Physics

  • 1996

The evolution of the active area/isolation transition has resulted in modification of the isolation induced parasitic effects on the device. Based on experimental and simulation results, this paper

  • 79

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